JPS6282730U - - Google Patents

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Publication number
JPS6282730U
JPS6282730U JP17329685U JP17329685U JPS6282730U JP S6282730 U JPS6282730 U JP S6282730U JP 17329685 U JP17329685 U JP 17329685U JP 17329685 U JP17329685 U JP 17329685U JP S6282730 U JPS6282730 U JP S6282730U
Authority
JP
Japan
Prior art keywords
semiconductor
heat treated
treatment apparatus
light
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17329685U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0525230Y2 (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP17329685U priority Critical patent/JPH0525230Y2/ja
Publication of JPS6282730U publication Critical patent/JPS6282730U/ja
Application granted granted Critical
Publication of JPH0525230Y2 publication Critical patent/JPH0525230Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Furnace Details (AREA)
  • Recrystallisation Techniques (AREA)
JP17329685U 1985-11-11 1985-11-11 Expired - Lifetime JPH0525230Y2 (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17329685U JPH0525230Y2 (en]) 1985-11-11 1985-11-11

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17329685U JPH0525230Y2 (en]) 1985-11-11 1985-11-11

Publications (2)

Publication Number Publication Date
JPS6282730U true JPS6282730U (en]) 1987-05-27
JPH0525230Y2 JPH0525230Y2 (en]) 1993-06-25

Family

ID=31110622

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17329685U Expired - Lifetime JPH0525230Y2 (en]) 1985-11-11 1985-11-11

Country Status (1)

Country Link
JP (1) JPH0525230Y2 (en])

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02126634A (ja) * 1988-11-07 1990-05-15 Hitachi Ltd 半導体装置の製造方法および製造装置
JP2011100849A (ja) * 2009-11-06 2011-05-19 Ushio Inc シリコン薄膜の処理方法およびフラッシュランプ照射装置
JP2013507775A (ja) * 2009-10-09 2013-03-04 アプライド マテリアルズ インコーポレイテッド 基板の加熱および冷却の制御改善のための装置および方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02126634A (ja) * 1988-11-07 1990-05-15 Hitachi Ltd 半導体装置の製造方法および製造装置
JP2013507775A (ja) * 2009-10-09 2013-03-04 アプライド マテリアルズ インコーポレイテッド 基板の加熱および冷却の制御改善のための装置および方法
JP2011100849A (ja) * 2009-11-06 2011-05-19 Ushio Inc シリコン薄膜の処理方法およびフラッシュランプ照射装置

Also Published As

Publication number Publication date
JPH0525230Y2 (en]) 1993-06-25

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